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Chemraz™ 657

Specifically developed to meet the demands of aggressive dry plasma systems, Chemraz® 657 perfluoroelastomer's unique formulation provides enhanced plasma resistance and minimal contamination resulting in less downtime and higher wafer processing yields. Recommended primarily for both static and dynamic oxide etch wafer processing applications, Chemraz 657 remains stable at service temperatures up to 280°C (536°F) with excursions to 300°C (572°F).

Brand: Chemraz (46 products)

Polymer Name: Perfluoroelastomer (FFKM)

Features: High Purity, Low Hardness, Soft

Enhanced TDS

Enhanced TDS

Knowde-enriched technical product data sheet

Identification & Functionality

Chemical Family
Technologies

Features & Benefits

Applications & Uses

Plastics & Elastomers End Uses

Properties

Physical Form
Appearance
Translucent

Packaging & Availability

Country Availability
Regional Availability
  • Canada
  • North America
  • USA