SEMICOSIL® 6C2S

SEMICOSIL® 6C2S is a hyperpure hexachlorodisilane with ultra-high purity and low metal content. This product falls under the category of silanes used for chemical vapor deposition (CVD) and spin-on dielectrics (SOD). It was specifically developed for the semiconductor industry, serving as a precursor for low-temperature deposition processes and other applications within the field.

Brand: SEMICOSIL (27 products)

Functions: Precursor

Chemical Family: Silanes

Applicable Processes: Semiconductor Manufacturing

Technical Data Sheet

Enhanced TDS

Knowde-enriched technical product data sheet

Identification & Functionality

Chemical Family
Chemical Name
Industrial Additives Functions
Molecular formula
Cl₆Si₂
EC No.
236-704-1
CAS No.
13465-77-5
Technologies
Product Families

Features & Benefits

Applications & Uses

Markets
Applications
Applicable Processes
Application Details

SEMICOSIL 6C2S was developed for the semiconductor industry, e.g. as precursor for low temperature deposition processes.

Properties

Physical Form
Appearance
Colorless clear liquid
Soluble in
Organic solvents 
Typical Properties
ValueUnitsTest Method / Conditions
Boiling Point145°C-
Molecular Weight269--
Density (at 25°C)1.56g/cm³-
Hexachlorodisilanemin. 99.5%-
Hexachlorodisiloxanemax. 0.05%-
Melting Point-1°C-
Metallic Impurities Individualmax. 15.0 ppb-
Metallic Impurities Totalmax. 100.0 ppb-
Tetrachlorosilanemax. 0.2%-
Properties
  • Ultra high purity
  • Low metal content

Regulatory & Compliance

Packaging & Availability

Country Availability
Regional Availability
  • Africa
  • Asia
  • Europe
  • Latin America
  • North America
  • Oceania