Daikin Industries, Ltd. HFC-32 (CH2F2)

Daikin Industries, Ltd. HFC-32 (CH2F2) is a high-purity gas essential for semiconductor manufacturing, offering a purity of 99.99 vol% (4N) or higher. Specifically crafted for etching SiO₂, SiN, and low-k films, it serves the electrical and electronics sector, particularly in parts and component production.

Functions: Etchant

Applicable Processes: Semiconductor Manufacturing

Features: High Purity

Enhanced TDS

Knowde-enriched technical product data sheet

Identification & Functionality

Chemical Name
Industrial Additives Functions
CAS No.
75-10-5
EC No.
200-839-4
Technologies
Product Families
Chemical Formula

CH₂F₂

Features & Benefits

Labeling Claims
Industrial Additives Features
Product Highlights
  • Purity is 99.99vol% (4N) or more for semiconductor manufacturing.
  • Mainly suitable for etching SiO2, SiN and low-k films.

Applications & Uses

Properties

Physical Form
Physical Properties
ValueUnitsTest Method / Conditions
Boiling Point-51.7°C-
Molecular Weight52.02--
Vapor Pressure (at 20°C)1.39MPa-

Technical Details & Test Data

Inspection Items

Purity (excluding air content), other fluorocarbons, acid content, moisture, air content.

Safety & Health

Handling Method / Safety Information
  • Be sure to read the Safety Data Sheet (SDS) and precautions on the label before using.
  • This product has been developed for industrial purposes and we shall not guarantee the the safety if used for any other purposes. If it is going to be used for medical or food applications, please contact us in advice.

Packaging & Availability

Packing Specification

10L container, 47L container, etc.